Method of in-process measurement of wafer surface quality based on laser scattering principle

ZHANG Nan; TAO Zheng-su; GUO Rui-peng

doi:10.13873/j.1000-97872009.07.001

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Method of in-process measurement of wafer surface quality based on laser scattering principle

更新时间：2025-09-11

- Method of in-process measurement of wafer surface quality based on laser scattering principle
- Vol. 28, Issue 7, Pages: 104-106(2009)
- 作者机构：
  
  上海交通大学仪器科学与工程系
- 作者简介：
- 基金信息：
- DOI：10.13873/j.1000-97872009.07.001
  CLC： TG842
- Published：2009
- 稿件说明：
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[1]张楠,陶正苏,郭瑞鹏.一种基于光散射原理在线测量晶圆表面质量的方法[J].传感器与微系统,2009,28(07):104-106.

ZHANG Nan, TAO Zheng-su, GUO Rui-peng. Method of in-process measurement of wafer surface quality based on laser scattering principle[J]. 2009, 28(7): 104-106.
[1]张楠,陶正苏,郭瑞鹏.一种基于光散射原理在线测量晶圆表面质量的方法[J].传感器与微系统,2009,28(07):104-106. DOI： 10.13873/j.1000-97872009.07.001.

ZHANG Nan, TAO Zheng-su, GUO Rui-peng. Method of in-process measurement of wafer surface quality based on laser scattering principle[J]. 2009, 28(7): 104-106. DOI： 10.13873/j.1000-97872009.07.001.

摘要

在半导体工业中

晶圆表面质量的检测占据着重要的地位。选择粗糙度参数轮廓算术平均偏差Ra作为衡量表面质量的参数

根据晶圆的一般粗糙度范围（Ra为0.01

.8μm）

构建了一种基于光散射原理的视觉系统测量装置。通过分析光散射强度分布图像

提取出一些参数来表征Ra

达到检测晶圆表面质量的目的。给出了初步的实验结果

说明了此方案是可行的。

Abstract

As the basic material of IC chips

the surface quality of wafer plays an important role in the machining process of IC chips.The surface roughness parameter（Ra

i.e.the arithmetic average height parameter）is chose to evaluate the surface quality of wafer.According to the surface roughness range of silicon wafer（Ra=0.01

.8 μm）

an optical measurement based on the light scattering principle is established

which is founded on a machine vision system.By analyzing the images of the spatial distribution of the scattered light intensity

some parameters are selected to estimate Ra.Elementary experiment results are shown and the feasibility of this method is demonstrated.

关键词

Keywords

references

表面粗糙度光学测量方法研究进展 [J]. 王政平,张锡芳,张艳娥. 传感器与微系统 . 2007(09)

非接触式表面粗糙度测量研究新进展 [J]. 李粉兰,唐文彦,段海峰,郝建国. 激光与红外 . 2007(06)

表面粗糙度R a 和光学散射特征值S n 关系的研究 [J]. 王世华,周肇飞. 成都科技大学学报 . 1996(06)

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