Application of laser etching in patterning process of PVDF thin film covered with Cu-Ni

ZHU Xiaohang; WANG Renxin; BAI Jianxin; ZHANG Pengfei

doi:10.13873/J.1000-9787(2021)04-0154-03

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Application of laser etching in patterning process of PVDF thin film covered with Cu-Ni

更新时间：2025-09-11

- Application of laser etching in patterning process of PVDF thin film covered with Cu-Ni
- Issue 4, Pages: 154-156(2021)
- 作者机构：
  
  1. 中北大学动态测试技术省部共建国家重点实验室培育基地
  2. 声纳技术重点实验室
- 作者简介：
- 基金信息：
- DOI：10.13873/J.1000-9787(2021)04-0154-03
  CLC： TB383.2;TQ317;TN249
- Published：2021
- 稿件说明：
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ZHU Xiaohang, WANG Renxin, BAI Jianxin, et al. Application of laser etching in patterning process of PVDF thin film covered with Cu-Ni[J]. 2021, (4): 154-156.
DOI：

ZHU Xiaohang, WANG Renxin, BAI Jianxin, et al. Application of laser etching in patterning process of PVDF thin film covered with Cu-Ni[J]. 2021, (4): 154-156. DOI： 10.13873/J.1000-9787(2021)04-0154-03.

摘要

为了对表面镀有纳米级别金属层的聚偏氟乙烯(PVDF)压电薄膜上进行金属图案化处理

利用光刻技术

分别通过湿法腐蚀和干法刻蚀两种途径。实施了不同配方的湿法腐蚀、离子束刻蚀(IBE)、激光刻蚀对表层覆盖Ni-Cu的PVDF薄膜进行尝试。结果发现:激光刻蚀可以得到宽度为100μm

厚度为450 nm

长度为600μm的曲梁电极图案。

Abstract

For metal pattern processing on thin film on the surface coated with poly vinylidene fluoride（ PVDF）piezoelectric

using lithography technology

respectively by two ways of wet etching and dry etching.Different formulations of wet etching

ion beam etching（ IBE）

laser etching on surface of Ni-Cu PVDF thin film are implemented.It is found that laser etching can obtain width of 100 μm

thickness of 450 nm

length of 600 μm curved beam electrode pattern.

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