Convex corner compensation method of anisotropic etching in （100） crystal surface of silicon

GUO Yu-gang; WU Zuo-fei; TIAN Lei

doi:10.13873/J.1000-9787(2019)03-0025-03

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Convex corner compensation method of anisotropic etching in （100） crystal surface of silicon

更新时间：2025-09-11

- Convex corner compensation method of anisotropic etching in （100） crystal surface of silicon
- Issue 3, Pages: 25-27(2019)
- 作者机构：
  
  1. 中国航发控制系统研究所
  2. 中国电子科技集团公司第四十九研究所
- 作者简介：
- 基金信息：
- DOI：10.13873/J.1000-9787(2019)03-0025-03
  CLC： TP212
- Published：2019
- 稿件说明：
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GUO Yu-gang, WU Zuo-fei, TIAN Lei. Convex corner compensation method of anisotropic etching in （100） crystal surface of silicon[J]. 2019, (3): 25-27.
DOI：

GUO Yu-gang, WU Zuo-fei, TIAN Lei. Convex corner compensation method of anisotropic etching in （100） crystal surface of silicon[J]. 2019, (3): 25-27. DOI： 10.13873/J.1000-9787(2019)03-0025-03.

摘要

针对单晶硅(100)晶面在氢氧化钾(KOH)腐蚀液中各向异性腐蚀时的削角问题

进行了一项凸角补偿实验。通过不同尺寸与形状组合的〈110〉条形补偿结构

对长方形凸台进行补偿

最终获取具有期望效果的补偿结构。该方法应用于压力传感器芯片的过载保护结构设计。

Abstract

A convex corner compensation experiment of anisotropic etching in（ 100） crystal surface of silicon is proposed. The rectangle boss is compensated by〈110〉strips with different dimension and shape

and finally the expected compensation structure is obtained. The compensation method is used for design of overload protection structure in pressure sensor.

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