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Semi-supervised wafer map defect pattern recognition method based on non-uniform rotation
Design & Manufacture | 更新时间:2026-04-17
    • Semi-supervised wafer map defect pattern recognition method based on non-uniform rotation

    • Vol. 45, Issue 4, Pages: 89-95(2026)
    • CLC: TN407;TP391
    • Published:2026

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  • HU Xiaohan, CHEN Tian, LIANG Huaguo, et al. Semi-supervised wafer map defect pattern recognition method based on non-uniform rotation[J]. 2026, 45(4): 89-95. DOI:

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