A Loyld’s-Mirror laser interference lithography system and process are developed

which can be used to fabricate in large area two dimensional periodic pattern

this process is especially suitable for fabrication of periodic structure of opto-electronic devices and micro-electronic devices.Properties of several sorts of photoresists in this process are studied.This process do not need mask

expensive lens and light source with short wavelength.Initial experimental results show large area sub-miron periodic grating

dot arrays and cone array patterns can be fabricated by this process

which establishes the exciting foundation for the nanostructure fabrication with laser interference lithography.