JIANG Guo-guang1, WANG Zhen1, ZHANG Hong-quan1, et al. Fine etching technology research on platinum thin-film thermistor with high sensitivity[J]. 2013, 32(3): 53-55+58.
JIANG Guo-guang1, WANG Zhen1, ZHANG Hong-quan1, et al. Fine etching technology research on platinum thin-film thermistor with high sensitivity[J]. 2013, 32(3): 53-55+58. DOI: 10.13873/j.1000-97872013.03.015.
A ultra fine resistance grating structure with 5 000 Ω nominal resistance is designed to improve the sensitivity of the platinum thin-film thermistor.Based on the study of high precision dry etching technology
the technical problem that high quality fine lines can not be processed by traditional laser etching and reactive ion etching is solved and the processing of 7 μm characteristic size of platinum resistance lines is realized.Test and analysis show that the nominal resistance of platinum thermistor is 5 000±1.0 Ω at 0 ℃