WANG Kai, LIANG Ting, LEI Cheng, et al. Control technical study on wafer cutting gap fabricated by CO2 laser[J]. 2013, 32(3): 56-58. DOI: 10.13873/j.1000-97872013.03.003.
CO2激光器加工晶圆切缝控制工艺研究
摘要
晶体硅是当前最重要的半导体材料
主要用于微电子技术。随着微电子技术的发展
对晶圆的切割技术要求越来越高
而在实际切割中
对晶圆的切割十分注重于晶圆的切割宽度
以降低晶圆损耗。研究CO2激光切割机的脉宽、频率以及切割速度对晶圆切割宽度的影响
从而达到高效率、小宽度、高标准的激光切割加工。
Abstract
Crystal silicon is the most important semiconductor material
which is mainly used in microelectronics technology.With development of microelectronics technology
the technology demanding of cutting silicon wafer is becoming increasingly.In actual operation
cutting gap width of silicon wafer is paid more attention
so as to reduce wafer loss.Pulse width of CO2 laser cutting machine
frequency and effect of cutting speed on cutting width of silicom wafer are researched