A new method

which uses PROTEK material in MEMS wet etching process of silicon bulk technology to protect the metal

is introduced.All the IC processes can be done before the wet etching is executed when this new method is employed.The experimental results prove that the new method and the new process can protect the metal very well in wet etching process of the silicon bulk technology.This process can be used widely in KOH wet etching process of the silicon bulk technology and it can also be used in manufacture of photoelectronic devices.