1. 中北大学仪器科学与动态测试教育部重点实验室
2. 中北大学电子测试技术国家重点实验室
纸质出版:2012
移动端阅览
[1]唐军,郭浩,刘俊,赵锐.硅基外延GaAs材料的力学仿真分析[J].传感器与微系统,2012,31(05):37-39+43.
TANG Jun1, GUO Hao1, LIU Jun1, et al. Mechanical simulation analysis of the Si epitaxial GaAs[J]. 2012, 31(5): 37-39+43.
[1]唐军,郭浩,刘俊,赵锐.硅基外延GaAs材料的力学仿真分析[J].传感器与微系统,2012,31(05):37-39+43. DOI: 10.13873/j.1000-97872012.05.013.
TANG Jun1, GUO Hao1, LIU Jun1, et al. Mechanical simulation analysis of the Si epitaxial GaAs[J]. 2012, 31(5): 37-39+43. DOI: 10.13873/j.1000-97872012.05.013.
Si
GaAs
Si基异质外延GaAs三种材料的基本力学特性各有不同
通过理论计算和ANSYS仿真得出相同条件下Si基异质外延GaAs材料中GaAs应力转化率是Si和GaAs材料的1.26倍左右
应力造成的位移系数略小于Si
远远小于GaAs
同时经过计算得出Si基异质外延GaAs材料的量程是GaAs材料的5倍
说明Si基外延GaAs材料不仅机械特性良好
而且还明显优于Si和GaAs
有更好的力电耦合效应需要的机械特性。
The basic mechanical properties of materials of Si
GaAs and Si epitaxial GaAs are different.Using the theoretical calculation and ANSYS simulation the strain conversion rate of Si epitaxial GaAs is 1.26 times large than that of Si materials under the same conditions.The displacement coefficient is slightly less than Si
far less than GaAs materials.Meanwhile
the range of Si epitaxial GaAs is 5 times than GaAs materials by calculated.That means the mechanical properties of Si epitaxial GaAs is obviously better than the materials of Si and GaAs and a better force electric coupling effect.
微机械陀螺封装应力研究 [J]. 李亚山,闫俊杰,刘俊,石云波. 传感器与微系统 . 2011(04)
GaAs基矢量水声传感器工艺设计及性能测试 [D]. 仝召民. 中北大学 2008
GaAs基共振隧穿压阻式加速度计研究 [D]. 陈建军. 中北大学 2006
High-lifetime GaAs on Si using GeSi buffers and its potential for space photovoltaics [J] . J.A Carlin,S.A Ringel,A Fitzgerald,M Bulsara. Solar Energy Materials and Solar Cells . 2001 (1)
High-quality GaAs-related lateral junctions on Si by conformal growth [J] . E. Gil-Lafon,A. Videcoq,J. Napierala,D. Castelluci,A. Pimpinelli,B. Gérard,J. Jimenez,M. Avella. Optical Materials . 2001 (1)
Growth of stress-reduced GaAs on Si substrate by using epitaxial lift-off and MOCVD regrowth [J] . T Soga,J Arokiaraj,H Taguchi,T Jimbo,M Umeno. Journal of Crystal Growth . 2000 (1)
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