Micro-nano mask fabrication is the main process before micro-nano processing such as etching

deposition

and modification

and is a key step and foundation in micro-nano processing. The fabrication of micronano mask with high quality

flexibility

low cost

high efficiency is very important for scientific research and production in micro/nano electro-mechanical systems（MEMS/NEMS）

micro-nano technology

micro/nano electronic chips

and semiconductor devices. At present

the direct writing technique is a kind of mask pattern manufacturing technology which does not rely on mask plate and impression

and its fabrication process is simple with high precision and flexibility of mask production. Therefore

direct write technology is an important development direction for micro-nano mask fabrication. So

domestic and international various major fabrication technologies of micro/nano masks based on direct write technology is reviewed and the characteristics of various direct write mask technologies are summarized

as well as look forward to the development trend of the technology.