LI Shengli, HUANG Li, MA Zhanfeng, et al. Study on application of liquid No.1 in wafer-level packaging for MEMS[J]. 2021, (5): 12-14. DOI: 10.13873/J.1000-9787(2021)05-0012-03.
Ⅰ号液在MEMS晶圆级封装中的应用研究
摘要
Ⅰ号液是H
2
O
2
NH
3
·H
2
O和H
2
O的混合物。通过研究微机电系统(MEMS)晶圆级封装钛(Ti)粘附层在Ⅰ号液中的腐蚀特性
为新工艺开发和在线工艺维护提供数据支持。研究表明:1) Ti的腐蚀速率与H
2
O
2
含量成正比关系
其原因在于腐蚀Ti的有效基团OOH
-
离子浓度随H
2
O
2
含量的增加而增大;2) Ti的腐蚀速率随NH
3
·H
2
O含量的增加而减小
这是由于NH
3
·H
2
O促进了H
2
O
2
的分解与电离
降低了H
2
O
2
浓度
促使亚稳态、溶解性较强的Ti(OH)
2
O
2
向难溶的Ti(OH)
4
或氧化物沉淀转变
这些难溶物附着在Ti表面阻碍了反应的进行; 3)由于H
2
O
2
的不断电离并逐步衰减
Ti的腐蚀速率随着Ⅰ号液放置时间的延长而减小; 4)由于自然氧化层的存在
刚开始时
Ti腐蚀速率较慢
自然氧化层被清洗掉以后
Ti的腐蚀速率明显增加。
Abstract
Liquid No.1 is a mixture of hydrogen peroxide
ammonia and water.In order to provide data supports for new process development and on-line process maintenance
corrosion characteristics of titanium adhesion layer of wafer-level packaging for MEMS in liquid No.1 is studied.The results show that corrosion rate of titanium is proportional to the content of hydrogen peroxide
due to the concentration of OOH
-
ion
the effective group for titanium corrosion
increases with the increasing content of hydrogen peroxide.Corrosion rate of titanium decreases with the increasing content of ammonia
because ammonia can promote the decomposition and ionization of hydrogen peroxide
reduces concentration content of hydrogen peroxide
promotes metastable and highly soluble Ti(OH)
2
O
2
to transform into insoluble Ti(OH)
4
or oxide precipitation
which hinders the reaction through adhering to the surface of titanium.The corrosion rate of titanium decreases with the placing time of liquid No.1
due to the continuous ionization and gradual attenuation of hydrogen peroxide.Because of the existence of natural oxide layer
the corrosion rate of titanium is slowly at the beginning and then increases obviously after the natural oxide layer is washed away.