A two-dimensional electrostatic-driven micro scanning mirror for the Li DAR application is designed.Based on the micro-electro-mechanical system（ MEMS） technology

the micromirror processing process is designed to simplify the preparation process of the electrical isolation trench. The micromirror structures and isolation trenches between combs are patterned and etched at the same steps on the top silicon layer of a silicon on insulator（ SOI） wafer. These trenches are not filled with insulating materials. During backside releasing etch on the bottom silicon layer of the SOI wafer

mechanical structures are designed and formed to maintain the integrity of the micromirror. A two-dimensional resonant micromirror with Φ4 mm mirror surface is prepared

resonant frequency of micromirror is analyzed by using finite element simulation

the simulation results are consistent with the measurement data of the device. The measured resonant frequencies of the two-dimensional micromirror for the fast and slow-axis are 1618. 2 Hz and 328. 2 Hz

respectively. The corresponding optical scanning angles are 16° and21° respectively. with the square wave voltages of 40 V and 50 V. In addition

the dual axis of the micromirror works at this frequency and successfully scans the Lissajous figure.