Based on the research on exposure field layout of single substrate

the mathematical model for exposure field layout optimization is built

and the analytical expression for calculating the number of the exposure fields on a single substrate and the expression for calculating the coordinates of the exposure field vertices are derived.According to the geometric relationship between the exposure field vertex and the center point of the substrate

an algorithm for optimizing the exposure field distribution of substrates is developed.The algorithm is applied to the actual exposure production process.It is shown that the quantity of exposure field is reduced by 10 %

which improves the production efficiency of lithography machine.