In order to verify the unique advantages of aluminum nitride thin film in sensor design technology

take the vibration sensor as an example to perform the design and experimental research of aluminum nitride film MEMS vibration sensor

and conducts comparison test experimental research by designing and fabricating different electrodes at different positions of sensing structure. By comparing and calibrating the chip samples designed with various test electrodes on the vibrating table

it is verified that the aluminum nitride film MEMS vibration sensor can obtain good sensitivity characteristics and frequency response characteristics. The sensitivity response of the 4 Y electrodes is very consistent

and the difference in sensitivity response of different stress distribution areas can be distinguished; the 4 X electrodes also obtain better sensitivity frequency response

but due to the difference in electrode design and Y electrode

the response of the X electrode is a little bit different from 4 Y electrodes. The difference is that due to the smaller area of the X electrode

the influence of the distributed capacitance cannot be ignored.