PZT厚膜的电射流沉积研究

王大志; 吕景明; 郁风; 董维杰; 梁军生; 任同群

doi:10.13873/J.1000-9787(2016)02-0019-04

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PZT厚膜的电射流沉积研究

研究与探讨 | 更新时间：2025-09-11

- PZT厚膜的电射流沉积研究
- Research on electrohydrodynamic jet deposition of PZT thick films
- 传感器与微系统 2016年35卷第2期页码：19-22
- 作者机构：
  
  1. 大连理工大学辽宁省微纳米技术及系统重点实验室
  2. 辽宁出入境检验检疫局
- 作者简介：
- 基金信息：
  
  国家自然科学基金资助项目（51475081,201301622）;辽宁省自然科学基金资助项目（201300935）;辽宁省教育厅科学研究一般项目（201301504）
- DOI：10.13873/J.1000-9787(2016)02-0019-04
  中图分类号： TB34
- 纸质出版：2016
- 稿件说明：
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[1]王大志,吕景明,郁风,董维杰,梁军生,任同群.PZT厚膜的电射流沉积研究[J].传感器与微系统,2016,35(02):19-22.

WANG Da-zhi, L Jing-ming, YU Feng, et al. Research on electrohydrodynamic jet deposition of PZT thick films[J]. 2016, 35(2): 19-22.
[1]王大志,吕景明,郁风,董维杰,梁军生,任同群.PZT厚膜的电射流沉积研究[J].传感器与微系统,2016,35(02):19-22. DOI： 10.13873/J.1000-9787(2016)02-0019-04.

WANG Da-zhi, L Jing-ming, YU Feng, et al. Research on electrohydrodynamic jet deposition of PZT thick films[J]. 2016, 35(2): 19-22. DOI： 10.13873/J.1000-9787(2016)02-0019-04.

摘要

制备了锆钛酸铅（PZT）悬浮液

采用电射流沉积（EJD）技术

在硅衬底上沉积了PZT厚膜。研究了电射流沉积高度、流量及悬浮液混合条件对厚膜致密性的影响。结果表明:降低电射流沉积高度和流量有助于提高沉积PZT厚膜致密性;采用球磨方法充分混合PZT悬浮液

沉积的PZT厚膜致密性明显提高。采用优化的电射流沉积参数和球磨20 h的PZT悬浮液

制备了10μm无裂纹PZT厚膜

其压电常数d33为67 p C·N-1

相对介电常数εr为255。

Abstract

Electrohydrodynamic jet deposition（ EJD） technology combined with Pb-based lanthanum-doped zirconate titanates（ PZT） composite slurry is used to deposit PZT thick films on Si substrate. The effect of EJD working distance

flow rate and slurry mixing condition on compactness of PZT thick films are examined. The results show that the reduction of working distance and flow rate can help to increase a density of PZT thick film;mix PZT composite slurry using ball-milling method can significantly improve compactness of the deposited thick films. By using optimum EJD parameters and slurry ball-milling time of 20 h

crack-free PZT thick films with a thickness of 10 μm is deposited

it exhibits a relative permittivity of 255 and d33 of 67 p C·N- 1.

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references

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