Aiming at poor adhesion between Si substrate and sensitive materials in Si substrate microstructure gas sensor

a new Si substrate microstructure gas sensor is put forward by introducing nanoporous Al2O3 membranes between Si substrate and sensitive materials. The thermal analysis on Si substrate microstructure is made using ANSYS analysis software. A gas sensor is prepared on the Si substrate through a thin film process

a photolithography process and the anodic oxidation process

and the polyaniline sensitive material is permeated into nanoporous Al2O3 membrane by ultrasonic

and sensitivity characteristics of sensor to ammonia is detected at room temperature. The results show that nanoporous Al2O3 film is transplanted on Si substrate and increased the adhesion of the sensitive material; the response time is about 40 s

the recovery time is about 960 s

sensitivity increased with the increase of the ammonia concentration and show a good linear relationship.