In order to improve efficiency of lithography simulation

by studying the principles of lithography propose two kinds of polygon processing algorithms

and split polygons into a plurality of rectangles or triangles.Furthermore

use C language to design a complete lithography simulation system in Linux operating system. The specific optical parameters are: the wavelength of light source is 193 nm

the numerical aperture is at range of 0. 3

0

. 8

and adjustable range of partially coherent coefficient is of 0. 2

0. 8

and it can simulate complicated layout of45 nm

0. 18 μm

whose area may be from 1 μm × 1 μm to 10 μm × 10 μm

and is verified by several experiments.Experimen

tal results show that the edge details are preserved and the algorithm effectively reduces the computational complexity and computation time of lithography simulation

and the overall efficiency is improved over 20 %

which saves time for manufacture of chip of intelligent sensor system.